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Process Chemicals 

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Analysis of Process Chemicals

ICP-MS is used routinely to test for trace metal impurities at the ppt level in the many organic and inorganic chemicals that are used in semiconductor processing and device manufacturing. These chemicals range from high-purity cleaning solvents (e.g., tetramethyl ammonium hydroxide and methanol) to complex organic mixtures (post-etch cleaners, photoresist, etc.) and highly volatile solvents such as acetone. Other important chemicals include: hydrofluoric acid, hydrochloric acid, sulfuric acid, hydrogen peroxide, isopropyl alcohol, and phosphoric acid.

Agilent’s solutions for process chemical analysis

The new 7700s ICP-MS is configured for the ultra-trace elemental analysis of high-purity materials such as process chemicals used in the semiconductor industry. With a high-efficiency sample introduction system, 5th plasma gas line (for option gas addition), and second (reaction) cell gas line as standard on the 3rd generation Octopole Reaction System (ORS3) – the 7700s offers the highest performance for the removal of intense interferences in known and consistent matrices.

With unmatched cool plasma capability, as well as unsurpassed collision/reaction cell performance, the 7700s delivers industry leading performance for the measurement of easily ionized elements (Li, Na, K, Fe and Ca) in high-purity materials, allowing all common semiconductor analytical methods to be performed on the same instrument.

Agilent also offers a clean Integrated Autosampler (I-AS) for ultra-trace analysis applications. The I-AS is a fast, flexible and high-precision autosampler designed to eliminate the risk of cross-sample contamination.

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